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Title:  OPC technology development engineer

Department:  Mask & EDA Infrastructure Control Department
Location: 

Japan, JP

Job Function:  Hardware Engineering

Job Type: Permanent  - Full Time 

Travel Required: Up to 25% 

Remote Work Available: Yes 

 

Renesas is one of the top global semiconductor companies in the world. We strive to develop a safer, healthier, greener, and smarter world, and our goal is to make every endpoint intelligent by offering product solutions in the automotive, industrial, infrastructure and IoT markets. Our robust product portolio includes world-leading MCUs, SoCs, analog and power products, plus Winning Combination solutions that curate these complementary products. We are a key supplier to the world’s leading manufacturers of the electronics you rely on every day; you may not see our products, but they are all around you.

 

Renesas employs roughly 21,000 people in more than 30 countries worldwide. As a global team, our employees actively embody the Renesas Culture, our guiding principles based on five key elements: Transparent, Agile, Global, Innovative, and Entrepreneurial. Renesas believes in, and has a commitment to, diversity and inclusion, with initiatives and a leadership team dedicated to its resources and values. At Renesas, we want to build a sustainable future where technology helps make our lives easier. Join us and build your future by being part of what’s next in electronics and the world.

Background of Recruitment:

In order to form a pattern below the light source wavelength of the exposure tool, not only the technology development and improvement on the wafer process but also the optimization of design rule and mask pattern correction including OPC are required.
Although mask pattern correction including OPC is a precedent technology for SoC and MCU, it is also becoming necessary for analog and power devices that are advancing in refinement, and expansion of target devices is expected.
Since the vacanct position occurred in the OPC technology development engineer this time, we decided to recruit experienced person from outside the company.

 

Responsibilities:

Making full use the mask EDA tools, develop mask pattern correction technology such as OPC, and incorporate it into the mask data processing flow.

· OPC technology development
· Improvement of mask data processing flow including OPC technology development and its implementation.
· Design and execute a strategy of future mask EDA tools.

 

Required Skills and Work Experience:

MUST

· Over 5 years experience in OPC technology development using OPC tools (especially model-based OPC technology development)
· Communication skills with related department engineers and  tool vendors.
· Experienced in using a layout editor. 
· A person who can positively address the challenges they face.

WANT

· The experience of Lithography verification technology development.
· The Knowledge of lithography technology.

· English skill: be able to understand spoken English (TOEIC score around 500)